A new interferometric method for measuring the thickness of thick films-Reference-Cited by-同舟云学术

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A new interferometric method for measuring the thickness of thick films

Published:1967-05 Issue:5 Volume:44 Page:393-394
ISSN:0950-7671
Container-title:Journal of Scientific Instruments
language:
Short-container-title:J. Sci. Instrum.

Author:

Lockyer C

Publisher

IOP Publishing

Subject

General Medicine

Reference4 articles.

1. A specimen holder for film thickness measurement

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Four-Probe Bridges for In-Line Determination of Thickness and Sidewall Etch Angle of Surface Micromachined Thin Films;Applied Sciences;2018-11-29

2. A dual-styli micro-machined system for precise determination of the thickness of free-standing thin films;Optical Micro- and Nanometrology V;2014-05-01

3. Growth and characterization of calcium fluoride on (100) and (111) silicon substrates;Semiconductor Science and Technology;1992-11-01

4. Ein neues Röntgenverfahren zur relativen Dickenbestimmung dünner Metallschichten;Zeitschrift für Kristallographie;1972-11

5. BIBLIOGRAPHY;Intermetallic Semiconducting Films;1970

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