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The fabrication scheme of a high resolution and high aspect ratio UV-nanoimprint mold

  • Published:2009-11-06 Issue:49 Volume:20 Page:495303
  • ISSN:0957-4484
  • Container-title:Nanotechnology
  • language:
  • Short-container-title:Nanotechnology

Author:

Lim Kipil,Wi Jung-Sub,Nam Sung-Wook,Park Soo-Yeon,Lee Jae-Jong,Kim Ki-Bum

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Oxidative modification of imprinted nanopatterns assisted by heat and plasma;Thin Solid Films;2014-09

2. Experimental and numerical study on deformation behavior of polyethylene terephthalate two-dimensional nanochannels during hot embossing process;Journal of Micromechanics and Microengineering;2013-11-27

3. Study of multilayer systems in electron beam lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-11

4. Graphene as discharge layer for electron beam lithography on insulating substrate;Applied Physics Letters;2013-09-09

5. Nanopatterning of PMMA on insulating surfaces with various anticharging schemes using 30 keV electron beam lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-11
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