Focused electron beam induced processing and the effect of substrate thickness revisited-Reference-Cited by-同舟云学术

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Focused electron beam induced processing and the effect of substrate thickness revisited

Published:2013-07-30 Issue:34 Volume:24 Page:345301
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

van Dorp W F,Beyer A,Mainka M,Gölzhäuser A,Hansen T W,Wagner J B,Hagen C W,De Hosson J Th M

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/24/i=34/a=345301/pdf

Reference24 articles.

1. Gas-assisted focused electron beam and ion beam processing and fabrication

2. Focused, Nanoscale Electron-Beam-Induced Deposition and Etching

3. Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective

4. A critical literature review of focused electron beam induced deposition

5. Carbon nanopillar laterally grown with electron beam-induced chemical vapor deposition

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4. Top‐Down Fabrication of Atomic Patterns in Twisted Bilayer Graphene;Advanced Materials;2023-06-28

5. On the Electron-Induced Reactions of (CH3)AuP(CH3)3: A Combined UHV Surface Science and Gas-Phase Study;Nanomaterials;2022-08-08

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