Abstract
Abstract
Ultra-low energy ion implantation has become an attractive method for doping of two-dimensional materials and ultra-thin films. The new dynamic Monte Carlo program IMINTDYN based on the binary collision approximation allows a reliable prediction of low energy implantation profiles and target compositional changes, as well as efficient simulation of high energy light ion scattering. To demonstrate the quality of these predictions and simulations, we present a model case experiment where we implanted W ions into tetrahedral amorphous carbon with low (10 keV) and ultra-low (20 eV) ion energies and analyzed the W implantation profiles with high resolution Rutherford backscattering spectrometry (HR-RBS). This experiment is compared with a complete simulation of all aspects of ion-solid-interactions of the experiment using the new IMINTDYN program. A unique novel simulation option, also relevant for implantation into 2D materials, is the inclusion of the vacancy as target species with dynamic vacancy generation and annihilation. Whereas simulations neglecting vacancy formation cannot reproduce the measured implantation profiles, we find excellent agreement between simulated and measured HR-RBS spectra. We also demonstrate the important role of simultaneous weak collisions in the binary collision approximation at low projectile energies.
Subject
Metals and Alloys,Polymers and Plastics,Surfaces, Coatings and Films,Biomaterials,Electronic, Optical and Magnetic Materials
Cited by
1 articles.
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