Ion Implantation of Graphene—Toward IC Compatible Technologies

Author:

Bangert U.1,Pierce W.1,Kepaptsoglou D. M.2,Ramasse Q.2,Zan R.1,Gass M. H.23,Van den Berg J. A.4,Boothroyd C. B.5,Amani J.6,Hofsäss H.6

Affiliation:

1. School of Materials, The University of Manchester, Manchester M13 9PL, United Kingdom

2. SuperSTEM Laboratory, STFC Daresbury Campus, Daresbury WA4 4AD, United Kingdom

3. AMEC, Walton House, 404 The Quadrant, Birchwood, WA3 6GA, United Kingdom

4. School of Computing, Science and Engineering, University of Salford, Salford, Greater Manchester M5 4WT, United Kingdom

5. Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons and Peter Gruenberg Institute, Juelich Research Centre, D-52425 Juelich, Germany

6. II. Physikalisches Institut, Georg-August-Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

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