Sputter hot filament hollow cathode ion source and its application to ultra-low energy ion implantation in 2D materials
Author:
Funder
Deutsche Forschungsgemeinschaft
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference15 articles.
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2. The role of ion implantation in cmos scaling: A tutorial review;M.I. Current;AIP Conf. Proc.,2019
3. Doping and growth of diamond-like carbon films by ion beam deposition;Hofsäss;Diam. Relat. Mater.,1994
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