Low-Temperature Growth of Polycrystalline silicon Films by SiCl 4 /H 2 rf Plasma Enhanced Chemical Vapour Deposition
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Reference17 articles.
1. Growth of very low temperature polysilicon film by remote plasma-enhanced chemical-vapor deposition
2. Structure and hydrogen content of stable hot-wire-deposited amorphous silicon
3. The effect of hydrogen dilution on the microstructure and stability of a-Si:H films prepared by different techniques
4. Deposition of amorphous silicon films by hot-wire chemical vapor deposition
5. Electrical and structural properties of low temperature boron- and phosphorus-doped polycrystalline silicon thin films prepared by ECR-CVD
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