The effect of hydrogen dilution on the microstructure and stability of a-Si:H films prepared by different techniques
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference7 articles.
1. Very stable a-Si:H prepared by ‘‘chemical annealing’’
2. Deposition of device quality, lowHcontent amorphous silicon
3. Deposition of device quality a-Si:H films with the hot-wire technique
4. Density of glow discharge amorphous silicon films determined by spectroscopic ellipsometry
5. Some aspects on an improved stability of a-Si:H and a-Ge:H films with respect to their microstructure
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1. Growth, structural and vibrational properties of hydrogenated nanocrystalline silicon thin films prepared by radiofrequency magnetron sputtering technique at room temperature;Thin Solid Films;2023-03
2. Detailed review on c-Si/a-Si:H heterojunction solar cells in perspective of experimental and simulation;Microelectronic Engineering;2022-09
3. Giant enhancement of free charge carrier concentration in boron-doped amorphous hydrogenated silicon under femtosecond laser crystallization;Applied Physics Letters;2018-11-12
4. Forty years of the Staebler–Wronski effect;Philosophical Magazine;2018-07-09
5. Effect of H-dilution and hydrogen bonding configuration on optical and electronic properties of a-Si:H/a-Ge:H multilayers;physica status solidi (c);2011-06-20
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