Structure and hydrogen content of stable hot-wire-deposited amorphous silicon
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.122732
Reference12 articles.
1. Reversible conductivity changes in discharge‐produced amorphous Si
2. Hydrogen diffusion and electronic metastability in amorphous silicon
3. Deposition of device quality, lowHcontent amorphous silicon
4. Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous silicon
5. Amorphous and microcrystalline silicon by hot wire chemical vapor deposition
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2. An amorphous-to-crystalline phase transition within thin silicon films grown by ultra-high-vacuum evaporation and its impact on the optical response;Journal of Applied Physics;2016-02-14
3. Effect of silane/hydrogen ratio on microcrystalline silicon thin films by remote inductively coupled plasma;Journal of Applied Physics;2013-05-28
4. Two-step annealing of hot wire chemical vapor deposited a-Si:H films;Journal of Materials Science: Materials in Electronics;2007-07-18
5. Low-Temperature Growth of Polycrystalline silicon Films by SiCl 4 /H 2 rf Plasma Enhanced Chemical Vapour Deposition;Chinese Physics Letters;2003-09-24
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