AlGaN/GaN Metal-Insulator-Semiconductor High Electron-Mobility Transistor Using a NbAlO/Al 2 O 3 Laminated Dielectric by Atomic Layer Deposition-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

AlGaN/GaN Metal-Insulator-Semiconductor High Electron-Mobility Transistor Using a NbAlO/Al 2 O 3 Laminated Dielectric by Atomic Layer Deposition

Published:2012-02 Issue:2 Volume:29 Page:028501
ISSN:0256-307X
Container-title:Chinese Physics Letters
language:
Short-container-title:Chinese Phys. Lett.

Author:

Bi Zhi-Wei,Hao Yue,Feng Qian,Gao Zhi-Yuan,Zhang Jin-Cheng,Mao Wei,Zhang Kai,Ma Xiao-Hua,Liu Hong-Xia,Yang Lin-An,Mei Nan,Chang Yong-Ming

Publisher

IOP Publishing

Subject

General Physics and Astronomy

Link

https://iopscience.iop.org/article/10.1088/0256-307X/29/2/028501/pdf

Reference20 articles.

1. AlGaN/GaN HEMTs-an overview of device operation and applications

2. Si3N4/AlGaN/GaN–metal–insulator–semiconductor heterostructure field–effect transistors

3. Large Gate Leakage Current in AlGaN/GaN High Electron Mobility Transistors

4. High-power SiO2∕AlGaN∕GaN metal-oxide-semiconductor heterostructure field-effect transistors

5. GaN MOS-HEMT Using Ultra-Thin Al 2 O 3 Dielectric Grown by Atomic Layer Deposition

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improved performance of AlGaN/GaN HEMT by N 2 O plasma pre-treatment;Chinese Physics B;2015-02

2. A Novel Controllable Hybrid-Anode AlGaN/GaN Field-Effect Rectifier with Low Operation Voltage;Chinese Physics Letters;2012-10

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3