Inverse problem of Mueller polarimetry for metrological applications
Author:
Affiliation:
1. LPICM , CNRS , Ecole polytechnique , IP Paris , Palaiseau , 91128 , France
Abstract
Publisher
Walter de Gruyter GmbH
Subject
Applied Mathematics
Link
https://www.degruyter.com/document/doi/10.1515/jiip-2020-0140/pdf
Reference26 articles.
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2. C. Fallet, T. Novikova, M. Foldyna, S. Manhas, B. Haj Ibrahim, A. De Martino, C. Vannuffel and C. Constancias, Overlay measurements by Mueller polarimetry in back focal plane, J. Micro/Nanolith. MEMS MOEMS 10 (2011), Article ID 033017.
3. F. Ferrieu, T. Novikova, C. Fallet, S. Ben Hatit, C. Vannuffel and A. De Martino, Analysis of textured films and periodic grating structures with Mueller matrices: A new challenge in instrumentation with the generation of angle-resolved SE polarimeters, Thin Solid Films 519 (2011), 2608–2612.
4. E. Garcia-Caurel, A. De Martino and B. Drévillon, Spectroscopic Mueller polarimeter based on liquid crystal devices, Thin Solid Films 455–456 (2004), 120–123.
5. D. Goldstein, Polarized Light, Marcel Dekker, New York, 2003.
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