1. Double patterning for 32nm and below: an update;Finders,2008
2. Advanced metrology for the 14 nm node double patterning lithography;Carau,2014
3. Double patterning requirements for optical lithography and prospects for optical extension without double patterning;Hazelton,2008
4. Towards 3nm overlay and critical dimension uniformity: an integrated error budget for double patterning lithography;Arnold,2008
5. Fundamentals of overlay measurement and inspection using scanning electron-microscope;Kato,2013