Process-Induced Delay Variation in SWCNT, MWCNT, and Mixed CNT Interconnects
Author:
Publisher
Informa UK Limited
Subject
Electrical and Electronic Engineering,Computer Science Applications,Theoretical Computer Science
Link
http://www.tandfonline.com/doi/pdf/10.1080/03772063.2015.1025110
Reference19 articles.
1. Carbon Nanomaterials: The Ideal Interconnect Technology for Next-Generation ICs
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4. Carbon Nanomaterials for Next-Generation Interconnects and Passives: Physics, Status, and Prospects
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