Fabrication of Planar and Three-Dimensional PZT Capacitors with Ir-Based Electrodes Solely by Low-Temperature MOCVD Using a Novel Liquid Ir Precursor-Reference-Cited by-同舟云学术

Fabrication of Planar and Three-Dimensional PZT Capacitors with Ir-Based Electrodes Solely by Low-Temperature MOCVD Using a Novel Liquid Ir Precursor

Published:2004-01 Issue:1 Volume:68 Page:85-94
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

FUJISAWA H.¹,WATARI S.²,IWAMOTO N.¹,SHIMIZU M.¹,NIU H.¹,OSHIMA N.³

Affiliation:

1. a Department of Elect. Eng. and Comp. Sci., Graduate School of Engineering, University of Hyogo , 2167 Shosha, Himeji, Hyogo, Japan , 671-2201

2. b Department of Elect. Eng. and Comp. Sci., Graduate School of Engineering, Himeji Institute of Technology , 2167 Shosha, Himeji, Hyogo, Japan , 671-2201

3. c Tokyo Research Center, TOSOH Corporation , 2743-1, Hyakawa, Ayase, Kanagawa, Japan , 252-1123

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10584580490895699

Reference19 articles.

1. Preparation of Pb(Zr,Ti)O3thin films on electrodes including IrO2

2. Preparation ofPb(Zr,Ti)O3Thin Films on Ir andIrO2Electrodes

3. Low-temperature vapour deposition of high-purity iridium coatings from cyclooctadiene complexes of iridium. Synthesis of a novel liquid iridium chemical vapour deposition precursor

4. Preparation of Iridium Films by Liquid Source Metalorganic Chemical Vapor Deposition

5. Precursor chemistry and film growth with (methylcyclopentadienyl) (1,5-cyclooctadiene)iridium

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