Deposition of Iridium Thin Films on Three-Dimensional Structures With PE-MOCVD-Reference-Cited by-同舟云学术

Deposition of Iridium Thin Films on Three-Dimensional Structures With PE-MOCVD

Published:2015-01-02 Issue:1-2-3 Volume:21 Page:46-53
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Yeh Chia-Pin¹,Lisker Marco²,Bläsing Jürgen³,Khorkhordin Oleksandr¹,Kalkofen Bodo¹,Burte Edmund P.¹

Affiliation:

1. Institute of Micro and Sensor Systems; Otto von Guericke University Magdeburg; Universitätsplatz 2, 39106 Magdeburg Germany

2. IHP; Im Technologiepark 25, 15236 Frankfurt (Oder); Germany

3. Institute of Experimental Physics; Otto von Guericke University Magdeburg; Universitätsplatz 2, 39106 Magdeburg Germany

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.201407133/fullpdf

Reference17 articles.

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2. Current Status of Ferroelectric Random-Access Memory

3. Preparation of Pb(Zr,Ti)O3thin films on electrodes including IrO2

4. Preparation ofPb(Zr,Ti)O3Thin Films on Ir andIrO2Electrodes

5. Fabrication of Planar and Three-Dimensional PZT Capacitors with Ir-Based Electrodes Solely by Low-Temperature MOCVD Using a Novel Liquid Ir Precursor

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