NANOMIXED TiO2-Ga2O3THIN FILMS GROWN BY PLASMA ENHANCED ATOMIC LAYER DEPOSITION (PEALD) METHOD-Reference-Cited by-同舟云学术

NANOMIXED TiO2-Ga2O3THIN FILMS GROWN BY PLASMA ENHANCED ATOMIC LAYER DEPOSITION (PEALD) METHOD

Published:2006-11 Issue:1 Volume:85 Page:155-164
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

LIU G. X.¹,SHAN F. K.¹,LEE W. J.¹,LEE G. H.¹,KIM I. S.¹,SHIN B. C.¹

Affiliation:

1. a Electronic Ceramics Center & Department of Nano Technology , DongEui University , Busan, 614-714, Korea

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10584580601085834

Reference14 articles.

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4. Leskela , M. and Niinisto , L. 1990.Atomic Layer Epitaxy, Edited by: Suntola , T. and Simpson , M. 1London: Blackie.

5. Crystalline Oxides on Silicon: The First Five Monolayers

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