On the annealing of damage produced by copper ion implantation of silicon single crystals
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337577408232047
Reference14 articles.
1. On the annealing of damage produced by boron ion implantation of silicon single crystals
2. Nucleation of damage centres during ion implantation of silicon
3. Correlation of electron microscope studies with the electrical properties of boron implanted silicon
4. Implantation and Annealing Behavior of Group III and V Dopants in Silicon as Studied by the Channeling Technique
5. Precipitation of boron atoms implanted in silicon as detected by channeling analysis
Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The influence of high implant concentration on solid phase epitaxial regrowth in (100) and (111) silicon;Radiation Effects;1980-01
2. TEM study of the two‐step annealing of arsenic‐implanted 〈100〉 silicon;Journal of Vacuum Science and Technology;1979-03
3. Nature and Annealing Behavior of Disorders in Ion Implanted Silicon;Japanese Journal of Applied Physics;1978-08
4. On the annealing behaviour of dysprosium ion implanted nickel: A combined study using Rutherford backscattering, transmission electron microscopy, and total current spectroscopy;Nuclear Instruments and Methods;1978-02
5. The recrystallization of ion-implantedsilicon layers;Radiation Effects;1978-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3