Dose rate effects in indium implanted GaAs
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337577408232421
Reference20 articles.
1. PhD Thesis;Haskell J. D.,1971
2. Low temperature channeling measurements of ion implantation lattice disorder in GaAs†
3. Harris, J. S. 1971.Int. Conf. on Ion Implantation, Garmisch, Edited by: Ruge, I. and Graul, J. 157–67. Berlin: Springer-Verlag.
4. Lattice disorder produced in GaAs by 60 keV Cd ions and 70 keV Zn ions
5. Radiation damage by implanted ions in GaAs and GaP
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1. Production of amorphous zones in GaAs by the direct impact of energetic heavy ions;Journal of Applied Physics;2000-01
2. Structural-phase transitions of GaAs;Journal of Applied Spectroscopy;1996-11
3. Dose‐rate effects in GaAs investigated by discrete pulsed implantation using a focused ion beam;Journal of Applied Physics;1996-10
4. Direct measurement of CAsin group III+C coimplanted GaAs;Journal of Applied Physics;1994-04-15
5. Defect nucleation in weakly damaged ion implanted GaAs;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-04
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