Incorporation of Dust Particles into a Growing Film During Silicon Dioxide Deposition from a TEOS/O2Plasma
Author:
Publisher
Informa UK Limited
Subject
Pollution,General Materials Science,Environmental Chemistry
Link
http://www.tandfonline.com/doi/pdf/10.1080/027868290950257
Reference23 articles.
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2. Barnes, M. and Keller, J. and Forster, J. and O'Neill, J. and Coultas, D. (1992) Transport of Dust Particles in Glow Discharge Plasmas Phys. Rev. Lett., 68, pp. 313 - 316. [PUBMED][INFOTRIEVE][CROSSREF]
3. Bose, D. and Govindan, T. and Meyyappan, M. (2000) Ion Dynamics Model for Collisionless Radio Frequency Sheaths J. Appl. Phys., 87, pp. 7176 - 7184. [CROSSREF]
4. DeCrosta, D. and Hackenberg, J. and Linn, J. (1996) Charge Issues in High Oxygen Gas Ratio Tetraethylorthosilicate Plasma Enhanced Chemical Vapor Deposition Films J. Vac. Sci. Technol. A, 14, pp. 709 - 713. [CROSSREF]
5. Fujimoto, T. and Okuyama, K. and Shimada, M. and Fujishige, Y. and Adachi, M. and Matsui, I. (2000) Particle Generation and Thin Film Surface Morphology in the Tetraethylorthosilicate/ Oxygen Plasma Enhanced Chemical Vapor Deposition Process J. Appl. Phys., 88, pp. 3047 - 3052. [CROSSREF]
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