Effects of Process Variables on TiN Particle Formation during Metallorganic Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Effects of Process Variables on TiN Particle Formation during Metallorganic Chemical Vapor Deposition

Published:2010 Issue:7 Volume:13 Page:H248
ISSN:1099-0062
Container-title:Electrochemical and Solid-State Letters
language:en
Short-container-title:Electrochem. Solid-State Lett.

Author:

Na Jeonggil,Kim Taesung,Choi Jae-Boong,Kim Young-Jin,Shin Yong-Hyeon,Yun Ju-Young,Kang Sang-Woo

Publisher

The Electrochemical Society

Subject

Electrical and Electronic Engineering,Electrochemistry,Physical and Theoretical Chemistry,General Materials Science,General Chemical Engineering

Reference21 articles.

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5. Particle beam mass spectrometer measurements of particle formation during low pressure chemical vapor deposition of polysilicon and SiO2 films

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