Investigation of Thermal Analysis on the Process of Laser-Assisted Nanoimprinting Lithography
Author:
Publisher
Informa UK Limited
Subject
Condensed Matter Physics,Numerical Analysis
Link
http://www.tandfonline.com/doi/pdf/10.1080/10407780701453966
Reference22 articles.
1. Imprint Lithography with 25-Nanometer Resolution
2. Nanoscale silicon field effect transistors fabricated using imprint lithography
3. Imprint lithography with sub-10 nm feature size and high throughput
4. Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels
5. Room-temperature Si single-electron memory fabricated by nanoimprint lithography
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1. Revised mathematical model for assessment of thermal characteristics developed in ultrafast pulse laser assisted nanoimprinting lithography on silicon based substrate surface;Optical and Quantum Electronics;2023-11-23
2. Literature Survey of Numerical Heat Transfer (2000–2009): Part II;Numerical Heat Transfer, Part A: Applications;2011-12
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