Properties of hydrogenated and fluorinated amorphous silicon–carbon alloy films prepared by magnetron sputtering
Author:
Affiliation:
1. a Research Institute of Electronics, Shizuoka University , Johoku, Hamamatsu , 432 , Japan
Publisher
Informa UK Limited
Subject
General Physics and Astronomy,General Chemical Engineering
Link
https://www.tandfonline.com/doi/pdf/10.1080/13642818708218348
Reference18 articles.
1. Electronic and optical properties of glow-discharge amorphous silicon-carbon alloys
2. The effects of incorporating fluorine in amorphous germanium-silicon alloy films
3. Plasma reactor design for the selective etching of SiO2 on Si
4. Control of Optical Gap in a-SixC1-x: H Alloy Films Produced by Reactive Sputtering Method
5. The Role of Halogens in the Plasma Polymerization of Hydrocarbons
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Fluorine‐induced suppression of disorder effects of carbon in the hydrogenated amorphous silicon‐carbon alloy thin films;Journal of Applied Physics;1995-01
2. Deposition of Fluorinated a ‐ SiC : H Films at Room Temperature;Journal of The Electrochemical Society;1994-12-01
3. Transmission electron microscopy of annealed a-Si1−xCx:H/Al films with different Al grain sizes;Thin Solid Films;1993-08
4. Enhancement of photoconductivity in r.f. glow-discharge-deposited a-SiC: H films doped with nitrogen;Philosophical Magazine B;1993-07
5. Differences in physical properties of hydrogenated and fluorinated amorphous silicon carbide prepared by reactive sputtering;Journal of Applied Physics;1992-06
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3