Fluorine‐induced suppression of disorder effects of carbon in the hydrogenated amorphous silicon‐carbon alloy thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.359354
Reference37 articles.
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1. UV–VISIBLE, FTIR AND RAMAN SPECTRA FROM LARGE BAND-GAP HYDROFLUORINATED AMORPHOUS SILICON–CARBON THIN FILMS;International Journal of Nanoscience;2010-12
2. Electrical Properties of Plasma Deposited Low-Dielectric-Constant Fluorinated Amorphous Carbon Films;Plasma Science and Technology;2006-11
3. Structural and optical characterization of fluorinated hydrogenated silicon carbide films deposited by pulsed glow discharge;Surface and Coatings Technology;2006-05
4. Effects of CF4 addition on oxygen contamination of SiC films in hot filament chemical vapor deposition using CH4+SiH4+H2;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2003-11
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