Observation of ring–shaped pulsed DC discharge plasma source using single pole magnet setups for material processing-Reference-Cited by-同舟云学术

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Observation of ring–shaped pulsed DC discharge plasma source using single pole magnet setups for material processing

Published:2019-03-29 Issue:5-6 Volume:174 Page:380-396
ISSN:1042-0150
Container-title:Radiation Effects and Defects in Solids
language:en
Short-container-title:Radiation Effects and Defects in Solids

Author:

Hossain Md. Amzad¹²^ORCID,Patwary M. A. Majed¹,Bhuiyan M. M. Rahman³,Nakamura Yutaro¹,Sugawara Kosei¹,Ohtsu Yasunori¹

Affiliation:

1. Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Saga University, Saga, Japan

2. Department of Electrical and Electronic Engineering, Jashore University of Science and Technology, Jashore, Bangladesh

3. Department of Physics, Faculty of Science and Engineering, Saga University, Saga, Japan

Funder

JSPS KAKENHI

Publisher

Informa UK Limited

Subject

Condensed Matter Physics,General Materials Science,Nuclear and High Energy Physics,Radiation

Link

https://www.tandfonline.com/doi/pdf/10.1080/10420150.2019.1596105

Reference42 articles.

1. Effect of the target temperature during magnetron sputtering of Nickel

2. Magnetron sputtering – Milestones of 30 years

3. Structure and properties of magnetron-sputtered manganese ferrite films

4. Capacitive radio frequency discharges with a single ring-shaped narrow trench of various depths to enhance the plasma density and lateral uniformity

5. Evaluation of the Electrical Asymmetry Effect by spectroscopic measurements of capacitively coupled discharges and silicon thin film depositions

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