Machine learning of fake micrographs for automated analysis of crystal growth process
Author:
Affiliation:
1. Institute of Applied Physics, University of Tsukuba, Tsukuba, Japan
Funder
JSPS
TEPCO Memorial Foundation
New Energy and Industrial Technology Development Organization
Publisher
Informa UK Limited
Subject
General Medicine
Link
https://www.tandfonline.com/doi/pdf/10.1080/27660400.2022.2082235
Reference66 articles.
1. Regrowth kinetics of amorphous Ge layers created by 74Ge and 28Si implantation of Ge crystals
2. Crystallization in amorphous germanium
3. Crystallization in amorphous silicon
4. Kinetics of solid phase crystallization in amorphous silicon
5. High-hole mobility polycrystalline Ge on an insulator formed by controlling precursor atomic density for solid-phase crystallization
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