Author:
IWASE Chikatsu,SHIRAYAMA Yuya,YOKOSUKA Shuntaro,KASHIMURA Kenta,HAYASHI Akihiro,SHIMBORI Shun'ichiro,TAKAHASHI Satoshi,HORIE Tomoyuki,TOKUMOTO Hiroshi,NAITOH Yasuhisa,SHIMIZU Tetsuo
Publisher
The Vacuum Society of Japan
Subject
Spectroscopy,Surfaces and Interfaces,Instrumentation,General Materials Science
Reference14 articles.
1. 1) International Roadmap Committee (Eds.): International Technology Roadmap for Semiconductors (ITRS), 2010 update, http://www.itrs.net/links/2010itrs/home2010.htm
2. Chemical Mechanical Planarization: Slurry Chemistry, Materials, and Mechanisms
3. Chemical mechanical polishing by colloidal silica-based slurry for micro-scratch reduction
4. 5) S. Shimbori, Y. Shirayama, T. Kawakami, S. Yokosuka, K. Kashimura, T. Wataya, T. Shimizu, Y. Naitoh and H. Tokumoto: J. Vac. Soc. Jpn., 53 (2010) 234.
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