Author:
Matsui Y.,Hiratani M.,Nakamura Y.,Asano I.,Yano F.
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Cited by
16 articles.
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1. Adsorption behavior of oxygen on Ti0.5Al0.5N (001) surface with X-doped (X = La, Ce, Y, Hf, Zr, Ta, Cr, Si): A first-principles study;Applied Surface Science;2023-12
2. Oxide overlayer formation on sputtered ScAlN film exposed to air;Applied Physics Letters;2022-09-12
3. Effect of Al content, substrate temperature and nitrogen flow on the reactive magnetron co-sputtered nanostructure in TiAlN thin films intended for use as barrier material in DRAMs;Journal of the Korean Physical Society;2015-03
4. Oxidation resistance of decorative (Ti,Mg)N coatings deposited by hybrid cathodic arc evaporation-magnetron sputtering process;Surface and Coatings Technology;2011-06
5. Influence of N2 partial pressure on mechanical properties of (Ti,Al)N films deposited by reactive magnetron sputtering;Vacuum;2009-03