Effect of Al content, substrate temperature and nitrogen flow on the reactive magnetron co-sputtered nanostructure in TiAlN thin films intended for use as barrier material in DRAMs-Reference-Cited by-同舟云学术

Effect of Al content, substrate temperature and nitrogen flow on the reactive magnetron co-sputtered nanostructure in TiAlN thin films intended for use as barrier material in DRAMs

Published:2015-03 Issue:6 Volume:66 Page:978-983
ISSN:0374-4884
Container-title:Journal of the Korean Physical Society
language:en
Short-container-title:Journal of the Korean Physical Society

Author:

Jalali Reza,Parhizkar Mojtaba,Bidadi Hasan,Naghshara Hamid,Hosseini Seyd Reza,Jafari Majid

Publisher

Korean Physical Society

Subject

General Physics and Astronomy

Link

http://link.springer.com/content/pdf/10.3938/jkps.66.978.pdf

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