Influence of N2 partial pressure on mechanical properties of (Ti,Al)N films deposited by reactive magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference21 articles.
1. Effect of heat treatment on the structure and properties of ion-plated TiN films
2. Anti-oxidation properties of TiAlN film prepared by plasma-assisted chemical vapor deposition and roles of Al
3. Thermal Treatment Effects on Microstructure and Mechanical Properties of TiAlN Thin Films
4. Nanocomposite Ti–Si–N, Zr–Si–N, Ti–Al–Si–N, Ti–Al–V–Si–N thin film coatings deposited by vacuum arc deposition
5. Structure, composition and microhardness of (Ti,Zr)N and (Ti,Al)N coatings prepared by DC magnetron sputtering
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1. Effects of nitrogen flow rate on the microstructure and mechanical and tribological properties of TiAlN films prepared via reactive magnetron sputtering;Ceramics International;2023-06
2. Effects of the carbon-to-nitrogen ratio on the microstructure and properties of (CrNbSiTiZr)C N high-entropy carbonitride films;Materials Chemistry and Physics;2022-02
3. A strategy to improve tool life by controlling cohesive failure in thick TiAlN coating during turning of CGI;The International Journal of Advanced Manufacturing Technology;2020-01-02
4. Improving the mechanical and anti-wear properties of AlTiN coatings by the hybrid arc and sputtering deposition;Surface and Coatings Technology;2019-11
5. Effects of Bias Voltage on Microstructure, Hardness and Bonding Strength of TiN Coating Deposited by High Power Pulsed Magnetron Sputtering;Solid State Phenomena;2018-08
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