Fabrication of single-phase SnS film by H2 annealing of amorphous SnSx prepared by atomic layer deposition-Reference-Cited by-同舟云学术

Fabrication of single-phase SnS film by H2 annealing of amorphous SnSx prepared by atomic layer deposition

Published:2017-05 Issue:3 Volume:35 Page:031506
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Jang Byeonghyeon¹,Yeo Seungmin²,Kim Hyungjun²,Shin Byungha³,Kim Soo-Hyun¹

Affiliation:

1. School of Materials Science and Engineering, Yeungnam University, Gyeongsan-si 712-749, South Korea

2. School of Electrical and Electronic Engineering, Yonsei University, Seodaemun-gu, Seoul 120-749, South Korea

3. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, South Korea

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4978892

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