XPS investigation of monoatomic and cluster argon sputtering of zirconium dioxide-Reference-Cited by-同舟云学术

XPS investigation of monoatomic and cluster argon sputtering of zirconium dioxide

Published:2023-05-23 Issue:4 Volume:41 Page:
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:

Author:

Burrell Michael C.¹^ORCID,Gillman Edward²^ORCID

Affiliation:

1. Fluor Marine Propulsion, Knolls Atomic Power Laboratory 1 , Schenectady, New York 12301-1072

2. Fluor Marine Propulsion, Bettis Atomic Power Laboratory 2 , West Mifflin, Pennsylvania 15122-0079

Abstract

The surfaces of zirconium dioxide and yttria-stabilized zirconia (YSZ) have been analyzed using x-ray photoelectron spectroscopy after ion sputtering with monoatomic Ar+ or an argon gas cluster ion beam (GCIB). The O/Z ratio and new components in the Zr 3d lines show reduction to lower oxidation states when sputtered with monoatomic Ar+, but significantly less damage is observed when GCIB sputtering is used. The damaged surface layer caused by Ar+ sputtering can be removed by subsequent GCIB sputtering. However, the depth resolution observed in depth profiles of thin YSZ films was significantly better when Ar+ sputtering is used. Differences in the Sn content in the oxidized Zr-4 specimen were also observed when comparing Ar+ and GCIB sputtering, suggesting preferential sputtering.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://pubs.aip.org/avs/jva/article-pdf/doi/10.1116/6.0002630/17790212/043202_1_6.0002630.pdf

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