Insight into the removal and reapplication of small inhibitor molecules during area-selective atomic layer deposition of SiO2-Reference-Cited by-同舟云学术

Insight into the removal and reapplication of small inhibitor molecules during area-selective atomic layer deposition of SiO2

Published:2021-01 Issue:1 Volume:39 Page:012402
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Merkx Marc J. M.¹^ORCID,Jongen Rick G. J.¹,Mameli Alfredo¹^ORCID,Lemaire Paul C.²,Sharma Kashish²,Hausmann Dennis M.²,Kessels Wilhelmus M. M.¹^ORCID,Mackus Adriaan J. M.¹^ORCID

Affiliation:

1. Department of Applied Physics, Eindhoven University of Technology, Eindhoven 5600MB, The Netherlands

2. Lam Research Corporation, Portland, Oregon 97062

Funder

Lam Research

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000652

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