Mechanical system construction for the EX-11 electron beam mask writer: A solution for 100 nm wafer lithography

Author:

Akeno Kiminobu,Ogasawara Munehiro,Tojo Toru

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Simulation tool design for the two-axis nano stage of lithography systems;Mechatronics;2010-08

2. EBM-5000: electron-beam mask writer for 45-nm node;SPIE Proceedings;2006-05-04

3. Evaluation of Mask Soaking Performance in a Thermally Stabilized Vacuum Chamber in an Electron Beam Mask Writer;Japanese Journal of Applied Physics;2004-06-29

4. Development of a mask-scan electron beam mask writer;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2002

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