EBM-5000: electron-beam mask writer for 45-nm node-Reference-Cited by-同舟云学术

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EBM-5000: electron-beam mask writer for 45-nm node

Published:2006-05-04 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Sunaoshi Hitoshi,Tachikawa Yuichi,Higurashi Hitoshi,Iijima Tomohiro,Suzuki Junichi,Kamikubo Takashi,Ohtoshi Kenji,Anze Hirohito,Katsumata Takehiko,Nakayamada Noriaki,Hara Shigehiro,Tamamushi Shuichi,Ogawa Yoji

Publisher

SPIE

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recent progress and future of electron multi-beam mask writer;Japanese Journal of Applied Physics;2023-02-17

2. Multi-beam mask writer MBM-2000PLUS;Novel Patterning Technologies 2022;2022-05-25

3. The mask contribution as part of the intra-field on-product overlay performance;Photomask Technology 2020;2020-10-12

4. Wafer alignment mark placement accuracy impact on the layer-to-layer overlay performance;Photomask Technology 2019;2019-09-26

5. The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay;Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology;2019-06-27

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