1. Extending immersion lithography down to 1x nm production nodes;Boeij,2013
2. The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay;Haren,2019
3. EBM-5000: Electron beam mask writer for 45 nm node;Sunaoshi,2006
4. In-die photomask registration and overlay metrology with PROVE using 2D correlation methods;Seidel,2011
5. Registration performance on EUV masks using high-resolution registration metrology;Steinert,2016