Simulation tool design for the two-axis nano stage of lithography systems
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Computer Science Applications,Mechanical Engineering,Control and Systems Engineering
Reference20 articles.
1. Mechanical system construction for the EX-11 electron beam mask writer: a solution for 100 nm wafer lithography;Akeno;J Vac Sci Technol,2002
2. Multiple electron-beam lithography;Chang;Microelectron Eng,2001
3. Advances in arrayed microcolumn lithography;Muray;J Vac Sci Technol,2000
4. Electron beam lithography: resolution limits and applications;Vieu;Appl Surf Sci,2000
5. XY stage driven by ultrasonic linear motors for the electron-beam X-ray mask writer EB-X3;Kunioka;J Vac Sci Technol,1999
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