Precisely controlled oscillating mirror system for highly uniform exposure in synchrotron radiation lithography-Reference-Cited by-同舟云学术

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Precisely controlled oscillating mirror system for highly uniform exposure in synchrotron radiation lithography

Published:1988-11 Issue:6 Volume:6 Page:2128
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Fujii K.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Performance of a wide-field flux delivery system for synchrotron x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11

2. X-ray lithography beamlines in the IBM Advanced Lithography Facility;IBM Journal of Research and Development;1993-05

3. High efficiency beamline for synchrotron radiation lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1991-11

4. Highly reliable oscillating mirror system for synchrotron radiation lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1991-11

5. Thermal stability improvement in novolak based resist by synchrotron radiation hardening process;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1991-09

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