X-ray lithography beamlines in the IBM Advanced Lithography Facility-Reference-Cited by-同舟云学术

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X-ray lithography beamlines in the IBM Advanced Lithography Facility

Published:1993-05 Issue:3 Volume:37 Page:395-410
ISSN:0018-8646
Container-title:IBM Journal of Research and Development
language:
Short-container-title:IBM J. Res. & Dev.

Author:

Silverman J. P.,Rippstein R. P.,Oberschmidt J. M.

Publisher

IBM

Subject

General Computer Science

Link

http://xplorestaging.ieee.org/ielx5/5288520/5389637/05389646.pdf?arnumber=5389646

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Performance of a compact beamline with high brightness for x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2000

2. Optical Design of High-Performance Beam Lines for X-Ray Lithography;Japanese Journal of Applied Physics;1999-06-15

3. Dynamic Response of Acoustic Delay Line for Beam Lines of Synchrotron Radiation Lithography System;Japanese Journal of Applied Physics;1998-12-30

4. An X-ray exposure system for 100-nm-order SR lithography;Microelectronic Engineering;1998-03

5. Lithography and fabrication processes for sub-100 nm scale complementary metal–oxide semiconductor;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-11

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