High efficiency beamline for synchrotron radiation lithography-Reference-Cited by-同舟云学术

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High efficiency beamline for synchrotron radiation lithography

Published:1991-11 Issue:6 Volume:9 Page:3214
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Kaneko Takashi

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Beamline BL-07 at Indus-2: a facility for microfabrication research;Journal of Synchrotron Radiation;2013-11-02

2. Capability of 70 nm Pattern Replication in X-Ray Lithography;Japanese Journal of Applied Physics;2001-03-15

3. Mask Error Factor in Proximity X-Ray Lithography;Japanese Journal of Applied Physics;2000-12-30

4. Dose Uniformity of a Compact Beamline in Routine Operation with a Storage Ring “AURORA-2S”;Japanese Journal of Applied Physics;2000-12-30

5. Performance of a compact beamline with high brightness for x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2000

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