Highly reliable oscillating mirror system for synchrotron radiation lithography
-
Published:1991-11
Issue:6
Volume:9
Page:3218
-
ISSN:0734-211X
-
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
-
language:
-
Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Applicability test for synchrotron radiation x-ray lithography in 64-Mb dynamic random access memory fabrication processes;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-11
2. Applications of faceted mirrors to X-ray lithography beamlines;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;1994-08
3. Sub-half-micron metal–oxide–semiconductor device fabrication using a compact synchrotron radiation lithography system;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11