Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning-Reference-Cited by-同舟云学术

Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning

Published:2010-11 Issue:6 Volume:28 Page:C6E23-C6E30
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

George Simi A.,Naulleau Patrick P.,Mochi Iacopo,Salmassi Farhad,Gullikson Eric M.,Goldberg Kenneth A.,Anderson Erik H.

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3502436

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2. Extreme ultraviolet microscope characterization using photomask surface roughness;Scientific Reports;2020-07-15

3. Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging;Applied Optics;2017-04-13

4. Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks;Extreme Ultraviolet (EUV) Lithography VII;2016-03-18

5. Beyond EUV lithography: a comparative study of efficient photoresists' performance;Scientific Reports;2015-03-18