Computational study and ion diffusion analyses of native defects and indium alloying in β-Ga2O3 structures

Author:

Martins Nathan Rabelo1ORCID,de Campos Viana Luiz Augusto Ferreira12ORCID,das Graças Santos Alan Antônio1ORCID,Borges Daiane Damasceno3ORCID,Welch Eric4ORCID,Borges Pablo Damasceno1ORCID,Scolfaro Luisa5ORCID

Affiliation:

1. Instituto de Ciências Exatas e Tecnológicas, Universidade Federal de Viçosa 1 , Rio Paranaiba, Minas Gerais 38810-000, Brazil

2. Instituto Federal de Educação, Ciência e Tecnologia – Campus Avançado Arcos 2 , Arcos, Minas Gerais 35588-000, Brazil

3. Instituto de Física, Universidade Federal de Uberlândia 3 , Uberlândia, Minas Gerais, Brazil , 38408-100

4. Prairie View A&M University 4 , Prairie View, Texas, 77466

5. Physics Department, Texas State University 5 , San Marcos, Texas, 78666

Abstract

Wide band gap semiconductors like gallium oxide are promising materials for high-power optoelectronic device applications. We show here a combined density functional theory and molecular dynamics study of diffusion pathways for different defects in β-Ga2O3. Molecular dynamics simulations result in a smaller equilibrium volume compared to density functional theory, but the overall lattice remains relatively unchanged even with the inclusion of defects, outside of the local distortions that occur to accommodate the presence of a defect. Slight thermal expansion occurs with elevated temperature and a combination of electron localization function and Bader charge analysis reveals that the oxygen interstitial is the most mobile defect as temperature is increased. However, interstitial cations may diffuse at elevated temperature due to a relatively small amount of charge transfer between the defect and lattice. The mobile oxygen defects are shown to increase the mobility of oxygen ions from the lattice, which can be beneficial for electrochemical applications when controlled through annealing processes.

Funder

Army Research Office

Fundação de Amparo à Pesquisa do Estado de São Paulo

Publisher

American Vacuum Society

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