Wet chemical etching process for wafer scale isolation and interconnection of GaSb based device layers grown on GaAs substrates-Reference-Cited by-同舟云学术

Wet chemical etching process for wafer scale isolation and interconnection of GaSb based device layers grown on GaAs substrates

Published:2013-05 Issue:3 Volume:31 Page:031204
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Min Kim Jung,Dutta Partha S.,Brown Eric,Borrego Jose M.,Greiff Paul

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4801008

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