The effect of thin metal overlayers on the electron beam exposure of polymethyl methacrylate

Author:

Samantaray C. B.1,Hastings J. T.1

Affiliation:

1. Department of Electrical and Computer Engineering, University of Kentucky, Lexington, Kentucky 40506-0046

Funder

NSF

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Fabrication of nanostructured transmissive optical devices on ITO-glass with UV1116 photoresist using high-energy electron beam lithography;Nanotechnology;2016-11-04

2. Charging suppression in focused-ion beam fabrication of visible subwavelength dielectric grating reflector using electron conducting polymer;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2015-11

3. Epitaxial patterning of thin-films: conventional lithographies and beyond;Journal of Micromechanics and Microengineering;2014-07-31

4. Study of multilayer systems in electron beam lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-11

5. Graphene as discharge layer for electron beam lithography on insulating substrate;Applied Physics Letters;2013-09-09

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