Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions-Reference-Cited by-同舟云学术

Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions

Published:2012-05 Issue:3 Volume:30 Page:031807
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Weilnboeck F.,Kumar N.,Oehrlein G. S.,Chung T.-Y.,Graves D.,Li M.,Hudson E. A.,Benck E. C.

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3697752

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