Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist-Reference-Cited by-同舟云学术

Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist

Published:2020-09 Issue:5 Volume:38 Page:052601
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Pranda Adam¹^ORCID,Lin Kang-Yi¹^ORCID,Engelmann Sebastian²^ORCID,Bruce Robert L.²^ORCID,Joseph Eric A.²,Metzler Dominik³,Oehrlein Gottlieb S.¹^ORCID

Affiliation:

1. Department of Materials Science and Engineering and Institute for Research in Electronics and Applied Physics, University of Maryland, College Park, Maryland 20742

2. IBM T. J. Watson Research Center, Yorktown Heights, New York 10598

3. IBM Semiconductor Technology Research, Albany, New York 12203

Funder

Semiconductor Research Corporation

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000289

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