Effect of carbon contamination on the printing performance of extreme ultraviolet masks-Reference-Cited by-同舟云学术

Effect of carbon contamination on the printing performance of extreme ultraviolet masks

Published:2010-03 Issue:2 Volume:28 Page:321-328
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Fan Yu-Jen,Yankulin Leonid,Antohe Alin,Thomas Petros,Mbanaso Chimaobi,Garg Rashi,Wang Yunfei,Wüest Andrea,Goodwin Frank,Huh Sungmin,Naulleau Patrick,Goldberg Kenneth,Mochi Iacopo,Denbeaux Gregory

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3333434

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2018-10

2. A Novel Cleaning Approach to Remove the Carbon Contaminant from Ru Surface of EUV Mask;ECS Transactions;2017-08-15

3. A new mask exposure and analysis facility;SPIE Proceedings;2014-10-08

4. Direct measurement of carbon contamination topography on patterned EUV masks;SPIE Proceedings;2014-04-17

5. Combined microscopies study of the C-contamination induced by extreme-ultraviolet radiation: A surface-dependent secondary-electron-based model;Applied Physics Letters;2012-05-14