Highly selective Si3N4/SiO2etching using an NF3/N2/O2/H2remote plasma. I. Plasma source and critical fluxes-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Highly selective Si3N4/SiO2etching using an NF3/N2/O2/H2remote plasma. I. Plasma source and critical fluxes

Published:2020-03 Issue:2 Volume:38 Page:023007
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Volynets Vladimir¹,Barsukov Yuri¹^ORCID,Kim Gonjun¹,Jung Ji-Eun¹,Nam Sang Ki¹,Han Kyuhee¹,Huang Shuo²^ORCID,Kushner Mark J.²^ORCID

Affiliation:

1. Mechatronics R&D Center, Samsung Electronics Co., Ltd, 1-1 Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do 18448, South Korea

2. Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave., Ann Arbor, Michigan 48109-2122

Funder

Samsung Electronics Co., Ltd.

US Department of Energy Office of Fusion Energy Sciences

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5125568

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic layer etching of SiO2 using sequential exposures of Al(CH3)3 and H2/SF6 plasma;Journal of Vacuum Science & Technology A;2024-09-01

2. Transformer coupled toroidal wave-heated remote plasma sources operating in Ar/NF₃ mixtures;Journal of Physics D: Applied Physics;2024-08-02

3. Pseudo‐Wet Plasma Mechanism Enabling High‐Throughput Dry Etching of SiO₂ by Cryogenic‐Assisted Surface Reactions;Small Methods;2024-06-02

4. Digital twin technology introduction to increase yield of processes;DTCO and Computational Patterning III;2024-04-10

5. Etching Mechanism Based on Hydrogen Fluoride Interactions with Hydrogenated SiN Films Using HF/H₂ and CF₄/H₂ Plasmas;ACS Applied Electronic Materials;2023-12-12

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3