Oxidation suppression in ytterbium silicidation by Ti∕TiN bicapping layer-Reference-Cited by-同舟云学术

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Oxidation suppression in ytterbium silicidation by Ti∕TiN bicapping layer

Published:2007-03 Issue:2 Volume:25 Page:285-289
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Jiang Yu-Long,Xie Qi,Detavernier Christophe,Van Meirhaeghe R. L.,Ru Guo-Ping,Qu Xin-Ping,Li Bing-Zong,Huang Anping,Chu Paul K.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.2464123

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of ultrathin yttrium silicide for NMOS source/drain contacts;Journal of Materials Science: Materials in Electronics;2023-05

2. Spectral purity Al/Yb/Al filter for vacuum ultraviolet at 50 to 100 nm;Optical Engineering;2020-05-27

3. On the formation and structural properties of hexagonal rare earth (Y, Gd, Dy, Er and Yb) disilicide thin films;Journal of Alloys and Compounds;2014-10

4. TaN∕Ta as an Effective Diffusion Barrier for Direct Contact of Copper and NiSi;Electrochemical and Solid-State Letters;2012

5. Erbium Silicide Growth in the Presence of Residual Oxygen;Journal of The Electrochemical Society;2011-05-11

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