Investigation of ultrathin yttrium silicide for NMOS source/drain contacts
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Published:2023-05
Issue:15
Volume:34
Page:
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ISSN:0957-4522
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Container-title:Journal of Materials Science: Materials in Electronics
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language:en
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Short-container-title:J Mater Sci: Mater Electron
Author:
Sun Xianglie, Xu JingORCID, Gao Jianfeng, Liu Jinbiao, He Yanping, Chen Xu, Kong Mengjuan, Li Yongliang, Li Junfeng, Wang Wenwu, Ye Tianchun, Luo Jun
Funder
Youth Innovation Promotion Association of CAS National Natural Science Foundation of China Key Laboratory of Microelectronic Devices Integrated Technology, Chinese Academy of Sciences
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference34 articles.
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